Search for: All records

The group III–V semiconductor photonic system is attractive to photonics engineers because it provides a complete set of photonic components. A plasmonic material that can be epitaxially integrated with the group III–V photonic system will potentially lead to many applications leveraging plasmonics and metamaterials. In this work, the shortest plasma wavelength ever reported in a III–V‐based material is demonstrated by epitaxially embedding ErAs into GaAs. This composite material acts as a tunable plasmonic material across the technologically important 2.68–6 µm infrared window. The growth window of this material is demonstrated to be much wider than other current heavily doped III–V plasmonic materials. Additionally, it is shown that the scattering rate can be reduced by increasing the growth temperature. The wide growth temperature range, designer plasmonic response, and the ease of epitaxial integration with other III–V semiconductor devices demonstrate the potential of ErAs:GaAs nanocomposites for the creation of a new type of metamaterial and other novel optoelectronic and nanophotonic applications.

Lanthanide monopnictide (Ln‐V) nanoparticles embedded within III–V semiconductors, specifically in In_0.53Ga_0.47As, are interesting for thermoelectric applications. The electrical conductivity, Seebeck coefficient, and power factor of co‐deposited TbAs:InGaAs over the temperature range of 300–700 K are reported. Using Boltzmann transport theory, it is shown that TbAs nanoparticles in InGaAs matrix give rise to an improved Seebeck coefficient due to an increase in scattering, such as ionized impurity scattering. TbAs nanoparticles act as electron donors in the InGaAs matrix while having minimal effects on electron mobility, and maintain high electrical conductivity. There is further evidence that TbAs nanoparticles act as energy dependent electron scattering sites, contributing to an increased Seebeck coefficient at high temperature. These results show that TbAs:InGaAs nanocomposite thinfilms containing low concentrations, specifically 0.78% TbAs:InGaAs, display high electrical conductivity, reduced thermal conductivity, improved Seebeck coefficient, and demonstrated ZT of power factors as high as 7.1 × 10⁻³W K⁻²m⁻¹and ZT as high as 1.6 at 650 K.